Low-energy ion implantation permits 2D lateral p-n junction development – Uplaza

The characteristic dimension of silicon-based transistors is approaching the theoretical restrict, which places ahead larger necessities for the atomic degree manufacturing of semiconductors. The essential concept of atomic degree manufacturing is to course of and manipulate issues with atomic degree precision, which is able to significantly cut back the ability consumption of the chip and obtain an enormous enhance within the chip’s arithmetic energy.

2D supplies are anticipated to deal with the challenges confronted by conventional silicon-based semiconductor units. The p-n junction is the essential unit of optoelectronic units within the info age.

Earlier research have proven that 2D vertical p-n junctions could be ready merely no matter lattice mismatch. Nonetheless, because of the van der Waals hole in interfaces and the impurities launched within the stacking course of, 2D vertical p-n junctions will cut back the service mobility.

The 2D lateral p-n junction can successfully remedy these issues. Subsequently, the right way to notice the development of high-quality 2D lateral p-n junction is essential for the sensible software of 2D semiconductors.

Ion implantation approach is a mature doping technique for setting up p-n junctions within the conventional semiconductor trade, which has the deserves of controllable doping focus and depth, ample doping parts, uniform doping space and non-polluting doping course of.

Nonetheless, because of the excessive power of incident ions (tens of keV), the normal ion implantation approach will trigger injury and even penetrate the atomically skinny 2D supplies throughout the implantation course of, leading to gadget failure. Subsequently, it’s tough to instantly modulate {the electrical} and optical properties of 2D supplies utilizing typical ion implantation.

In a paper revealed in Mild Science & Purposes, a workforce of scientists, led by Professor Xiangheng Xiao from Faculty of Physics and Expertise, Key Lab of Synthetic Micro- and Nano-Buildings of Ministry of Schooling, Wuhan College, Wuhan, China, has developed a low-energy ion implantation system for setting up 2D lateral p-n homojunction.

Low-energy ion implantation approach inherits some great benefits of the normal ion implantation approach. It has a decrease ion power and shallower implantation depth, which is anticipated to deal with the issue that conventional ion implantation methods can’t be instantly utilized to modulate the efficiency of 2D supplies.

Though a couple of teams have performed analysis on low-energy ion implantation, they’ve primarily centered on the microscopic characterization and defect modulation. So far, there’s a lack of analysis on utilizing low-energy ion implantation to attain patterned p-type doping on 2D supplies to fully reverse their conductivity sorts and assemble lateral p-n homojunctions.

By exactly modulating the implantation dose, the conductivity sort of the WS₂ flake is efficiently modulated, which might be transformed from n-type to bipolar and even p-type. The universality of this technique can also be demonstrated by extending it to different 2D semiconductors. As well as, the photodetector based mostly on WS₂ lateral p-n homojunction displays passable self-powered photodetection functionality.

This work supplies an efficient technique for controllable doping of 2D supplies and promotes the sensible software of 2D supplies.

The authors used the low-energy ion implantation approach to instantly implant nitrogen ions into the few-layer WS₂, and realized exact modulation of WS₂ conductive sort by controlling the implantation dose of low-energy nitrogen ions.

“By increasing the implantation dose, the conductive type of WS₂ can be changed from n-type to bipolar- or even p-type. At the ion implantation dose of 1×10¹⁴ ions cm^-2, the current on/off ratio of N-WS₂ FET can reach 3.9×10⁶. The performance of N-WS₂ FET does not deteriorate significantly after three months, indicating the stability of the doping method,” mentioned the researchers.

“Low-energy nitrogen ion implantation has been extended to other typical n-type two-dimensional metal chalcogenides materials, such as WSe₂, MoS₂ and SnS₂. Their conductivity types were successfully transformed from n-type to p-type, demonstrating the universality of the method,” they added.

By combining low-energy ion implantation approach with lithography approach, the authors realized patterned doping of 2D supplies. The WS₂ lateral p-n homojunction was efficiently fabricated.

“Kelvin probe force microscopy characterizes that there is an obvious surface potential difference in the junction region, and demonstrates the feasibility of constructing lateral p-n homojunction with patterned doping by this method. The p-n junction exhibits significant photovoltaic effect under illumination, and shows satisfactory self-powered photodetection ability under different wavelength lasers.”

“Under 532-nm laser illumination at 1.7 mW cm^-2, the self-powered photodetector based on this p-n junction can achieve an open-circuit voltage of 0.39 V, responsivity and detectivity of approximately 35 mA W^-1 and 9.8×10¹⁰ Jones.”

The researchers say, “This doping method compatible with integrated circuits shows a huge application potential on modulating the performance of 2D semiconductor devices, and provides a reliable strategy for promoting the practical application of 2D materials.”